Inductively coupled Plasma

 

The PlasmaTherm 790 series inductively coupled plasma / reactive ion etching (ICP/RIE) system is an invaluable part of our equipment inventory.  Due to NanoLabís strong interest in GaN and related material systems, for which there is no effective wet etchant, this system is the backbone of many of our fabrication needs.  The system is capable of an RIE power of 500 W and an ICP power of 1000 W and is equipped to introduce oxygen, chlorine, fluorine and nitrogen into the plasma environment.

  

Chris is installing his GaN sample for ICP etching

 

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